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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Michez, A. Bordure, G. Patin, Y. Gosselin, G. |
| Copyright Year | 1991 |
| Description | Author affiliation: Univ. des Sci. et Tech. du Languedoc, Montpellier, France (Michez, A.; Bordure, G.) |
| Abstract | The effect of 5 MeV alpha particles, 30 MeV /sup 12/C ions and 70 MeV /sup 63/Cu ions on a large area silicon P/sup +/N diode is simulated. Computer simulation is performed in 3D axisymmetric geometry with the device simulator ACCES. The effect of high LET particles with short track is compared to the effect of low LET particles with long track. The diffusion component of the collected charge is shown to be important for the three particles in this large area 10 V reverse-biased diode. |
| Starting Page | 419 |
| Ending Page | 423 |
| File Size | 314411 |
| Page Count | 5 |
| File Format | |
| ISBN | 0780302087 |
| DOI | 10.1109/RADECS.1991.213562 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1991-09-09 |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Helium Silicon Semiconductor diodes Doping Poisson equations Computational modeling Computer simulation Semiconductor process modeling Charge carrier processes Computational geometry |
| Content Type | Text |
| Resource Type | Article |
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