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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Gweon, B. Dan Bee Kim Rhee, J.K. Moon, S.Y. Choe, W. Kang, B.K. |
| Copyright Year | 2007 |
| Description | Author affiliation: Korea Adv. Inst. of Sci. & Technol., Daejeon (Gweon, B.; Dan Bee Kim; Rhee, J.K.; Moon, S.Y.; Choe, W.) |
| Abstract | Summary form only given. Plasma characteristics were studied through electrical and optical diagnostics for a volumetric (105 times 40 times 4 mm) RF plasma (MyPL; www.applasma.com) produced at the atmospheric pressure in the ambient air. The main discharge device has a conducting rod as a powered electrode, which is covered with a dielectric material and placed between two ground electrodes. A flow of the main supply gas is provided onto the conducting rod. The plasma length is extendable by having a longer rod. The plasma was produced at the peak to peak voltage of about 90 V with an ignition. The spatial uniformity of the visible emission was obtained through an image processing of the plasma image captured by a CCD camera. Varying the gas flow and the applied power, the uniformity along the length direction was maintained less than 10%. The gas temperature measured by a thermocouple and a fiber probe was between 300 and 400 K for the input power range of 40 and 100 W. The feasibility of plasma sterilization was also studied. An E-coli sample was treated with the plasma by varying treatment time, gas flow rate, treatment position etc. After the plasma treatment, the E-coli sample was cultured for 12 hours to study the plasma effects. So far, 30 s of treatment time is enough to kill every E-coli that there was none survived after the plasma treatment. |
| Starting Page | 502 |
| Ending Page | 502 |
| File Size | 39948 |
| Page Count | 1 |
| File Format | |
| ISBN | 9781424409150 |
| ISSN | 07309244 |
| DOI | 10.1109/PPPS.2007.4345808 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2007-06-17 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Atmospheric-pressure plasmas Plasma properties Radio frequency Plasma devices Plasma materials processing Plasma diagnostics Plasma measurements Plasma temperature Electrodes Fluid flow |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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