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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Protasevich, E.T. Shishkovsky, V.I. |
| Copyright Year | 2002 |
| Description | Author affiliation: Tomsk Politechnical Univ., Russia (Protasevich, E.T.; Shishkovsky, V.I.) |
| Abstract | Summary form only given, as follows. For manufacture of ultradisperse powder (UDP) oxides, the plasma chemistry decomposition of solutions and the developed installation with a capacity of 10 kW, are described. The basic unit of the given installation is plasma chemistry reactor with RF-plasmatron. The structure of the installation includes unit of submission of raw material and the electrofilter for gathering UDP oxides. The RF-plasmatron may carry out function not only the generator of plasma, but also a plasma chemistry reactor when the heat-carrier and reagents move in the reactor through system of submission. |
| Sponsorship | Plasma Sci. & Applictions Committee of the IEEE Nucl. & Plasma Sci. Soc |
| File Size | 94884 |
| File Format | |
| ISBN | 078037407X |
| DOI | 10.1109/PLASMA.2002.1030285 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2002-05-26 |
| Publisher Place | Canada |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Radio frequency Plasma applications Plasma chemistry Chemicals Plasma materials processing Inductors Plasma temperature Powders Zirconium Thermal spraying |
| Content Type | Text |
| Resource Type | Article |
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