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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Bon-Woong Koo Hershkowitz, N. Buhr, B. |
| Copyright Year | 1999 |
| Description | Author affiliation: Center for Plasma-Aided Manuf., Wisconsin Univ., Madison, WI, USA (Bon-Woong Koo) |
| Abstract | Summary form only given. Electrically confined negative ions are known as the precursors of particle formation in low pressure processing plasmas. The presence of negative ions can cause various negative aspects during the process: contamination of wafers, limitation of the manufacturing productivity and device reliability in microelectronics production. Various negative ions were detected in low-pressure, high-density Electron Cyclotron Resonance plasmas (H/sub 2/, O/sub 2/, CF/sub 4/, and Cl/sub 2/) by an Omegatron mass spectrometer. Preliminary results show H/sup -/ and H/sub 2//sup -/ in H/sub 2/ plasmas, O/sup -/ in O/sub 2/ plasmas, F/sup -/ and CF/sup -/ in CF/sub 4/ plasmas. Two other techniques were employed for the verifications of the observed negative ions: photo-detachment and a Langmuir probe in magnetized plasmas. (1) For photodetachment, a pulsed nitrogen laser (/spl sim/4 mJ, 50 nsec) was used to detach the electrons from H/sup $/and Cl/sup -/ and a cylindrical probe, positively biased above the plasma potential, was used to collect the additional electrons. (2) A Langmuir probe theory was developed and employed for various ECR plasmas (H/sub 2/, He, N/sub 2/, O/sub 2/, Ar and CF/sub 4/). The theory, adapted to magnetized, partially ionized, low temperature processing plasmas, was based on radial diffusion into the depleted flux tube unlike earlier work by Stangeby in fusion plasmas where Bohm diffusion dominates. |
| File Size | 129054 |
| File Format | |
| ISBN | 0780352246 |
| ISSN | 07309244 |
| DOI | 10.1109/PLASMA.1999.829280 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1999-06-24 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Plasma measurements Electrons Cyclotrons Resonance Plasma materials processing Plasma temperature Plasma confinement Plasma devices Probes Magnetic flux |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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