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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Rehak, P. Smith, G.C. Warren, J.B. Yu, B. |
| Copyright Year | 2000 |
| Description | Author affiliation: Instrum. Div., Brookhaven Nat. Lab., Upton, NY, USA (Rehak, P.) |
| Abstract | The Gas Electron Multiplier (GEM) represents one of the most promising micro-pattern detectors for providing stable, charge multiplication over a wide range of active areas, and with genuinely affordable and reproducible fabrication methods. Several important characteristics of the GEM remain to be investigated and optimized. One key feature is the charging-up of the dielectric insulating layer of GEMs and its dependence on hole geometry. Using an epoxy-based photoresist, we are developing a fabrication technique that naturally generates purely cylindrical holes in the GEM electrode, a geometry that has been found by previous researchers to minimize or eliminate this effect. This report describes the principle of the fabrication technique and presents experimental results of energy resolution, gain, rate capability and potential for large area applications. These compare favorably with the attributes of existing techniques. |
| File Size | 64121 |
| File Format | |
| ISBN | 0780365038 |
| ISSN | 10823654 |
| DOI | 10.1109/NSSMIC.2000.949081 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2000-10-15 |
| Publisher Place | France |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Fabrication Electron multipliers Geometry Laboratories Instruments Detectors Dielectrics and electrical insulation Resists Electrodes Energy resolution |
| Content Type | Text |
| Resource Type | Article |
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