NDLI: Focused ion beam process for a formation of metal/insulator/metal double tunnel junctions

Content Provider	IEEE Xplore Digital Library
Author	Nakayama, M. Yanagisawa, J. Wakaya, F. Gamo, K.
Copyright Year	1999
Description	Author affiliation: Dept. of Phys. Sci., Osaka Univ., Japan (Nakayama, M.)
Abstract	A small conductive island which is connected with source and drain via small tunnel junctions is a fundamental for single electron tunneling (SET) devices. An example of such structures consists of metal/insulator/metal double tunnel junctions and a metal oxide can be used as an insulator. Control of SET by the spin of tunneling electrons is possible by using magnetic metals as the island material, source and drain electrodes. However, microfabrication processes of magnetic metals for SET structures are not well established yet. We have proposed a new in situ process to fabricate small double tunnel junctions using a focused ion beam (FIB). This process is made up of following steps: after deposited metal films (Ni) on an insulator substrate are patterned to have a narrow channel (50 /spl mu/m in the present study) by photolithography was formed, a resist layer is spin-coated for the next lift-off step. The resist used is a double layer resist consisting of nitrocellulose and germanium films. Nitrocellulose can be used as a high-sensitive, selfdeveloping ion beam resist. 100 keV Ga FIB is irradiated across the channel to separate the metal channel and to form source and drain electrodes. To minimize the sputtered groove width which determines the island size, the resistance of the metal channel is monitored during the sputtering step and the FIB irradiation is ended just when the resistance become sharply infinite.
Starting Page	26
Ending Page	27
File Size	304495
Page Count	2
File Format	PDF
ISBN	4930813972
DOI	10.1109/IMNC.1999.797459
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1999-07-06
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Japan Soc. Of Applied Physics
Subject Keyword	Metal-insulator structures Ion beams Insulation Resists Electrons Magnetic separation Magnetic materials Electrodes Magnetic tunneling Inorganic materials
Content Type	Text
Resource Type	Article

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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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