NDLI: Design and Fabrication of Microfluidic Devices: MOSFET & Capacitor

Content Provider	IEEE Xplore Digital Library
Author	Osman, R.A. Esa, S.R. Poopalan, P.
Copyright Year	2007
Description	Author affiliation: Northern Malaysia Univ. Coll. of Eng., Perlis (Osman, R.A.; Esa, S.R.; Poopalan, P.)
Abstract	Microfluidic devices, based on silicon, are fabricated by photolithography, wet chemical etching with focus on an liquid conduction channel n-channel depletion MOSFET and a silica-liquid dielectric capacitor. Masks for both devices were designed with AutoCAD and printed on transparencies. Fabrication on p-<100> 4" Si wafers were executed and the devices were marginally characterized due to complications. The gate channel for the liquid FET (LFET) were set to four-sizes, which are 250 mum, 500 mum, 750 mum an 1000 mum. The liquid capacitor (LCap) size was limited to only two, for lack of space on the wafer. A variety of processes were used to fabricate these devices. Tests show feasibility of the idea but proves process and process parameter control is extremely important and critical.
Starting Page	321
Ending Page	327
File Size	1663863
Page Count	7
File Format	PDF
ISBN	9781424407293
ISSN	10898190
DOI	10.1109/IEMT.2006.4456474
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2007-11-08
Publisher Place	Malaysia
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Fabrication Microfluidics MOSFET circuits Capacitors Silicon Lithography Chemicals Wet etching Dielectric devices Dielectric liquids
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Electrical and Electronic Engineering

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