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Content Provider | IEEE Xplore Digital Library |
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Author | Hara, K. Kawashima, H. |
Copyright Year | 1995 |
Description | Author affiliation: Dept. of Electr. Eng., Tokyo Denki Univ., Japan (Hara, K.) |
Abstract | This paper describes a multifunctional humidity-gas sensor developed with thin-film technology, which is compatible with IC fabrication processes. The sensor is small and inexpensive, being fabricated on a silicon substrate using photolithography. The sensing material is a semiconducting Fe/sub 2/O/sub 3/-based thin film which is deposited by rf sputtering on a porous Al/sub 2/O/sub 3/ film. The impedance is measured between the top electrode (Pt) and the bottom electrode (Al). This sensor is sensitive to humidity, especially in middle and high humidity ranges at room temperature, while it is also sensitive to combustible gases such as hydrogen at 400/spl deg/C. The response time is short enough from a practical point of view. |
Starting Page | 158 |
Ending Page | 161 |
File Size | 401779 |
Page Count | 4 |
File Format | |
ISBN | 0780336224 |
DOI | 10.1109/IEMT.1995.541017 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 1995-12-04 |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Silicon Sputtering Substrates Semiconductor thin films Electrodes Temperature sensors Humidity Sensor phenomena and characterization Thin film sensors Fabrication |
Content Type | Text |
Resource Type | Article |
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