NDLI: Contact resistance evaluation of micro-contacts with upper hemisphere and lower planar or engineered surfaces

Content Provider	IEEE Xplore Digital Library
Author	Stilson, Christopher Laurvick, Tod Coutu, Ronald
Copyright Year	2014
Description	Author affiliation: Department of Electrical and Computer Engineering Air Force Institute of Technology Wright Patterson AFB, Ohio, 45433 (Stilson, Christopher; Laurvick, Tod; Coutu, Ronald)
Abstract	This paper presents a comparison of the resistance performance of Au-Au micro-contacts fabricated with planar and engineered lower contacts. Gray-scale lithography was used to construct 3D structures into photoresist. The structures were then etched into a silicon wafer using a Trion reactive ion etch (RIE) system. The engineered lower contact surfaces consisted of 2D pyramids and 3D pyramid patterns paired with a hemispherical upper contact. A microelectromechanical systems (MEMS) micro-contact support structure, consisting of a fixed-fixed beam, was micro machined as the upper contact. The micro-contact support structure was used as the platform for a hemisphere shaped upper contact. The micro-contacts were actuated using an external, calibrated load. To observe micro-contact performance, the contact resistance and force required to close the contact, were monitored throughout testing. Next the micro-contacts underwent contact resistance testing to evaluate how the engineered lower contacts affected performance. Results show that the 3D pyramid design closely matched the hemisphere/planar contact data with a contact resistance of 0.7Ω after $10^{7}$ cycles. The 2D pyramid pattern resulted in a higher contact resistance during initial testing and then ended with a contact resistance of 1.083Ω after $10^{7}$ cycles.
Starting Page	1
Ending Page	8
File Size	3555352
Page Count	8
File Format	PDF
e-ISBN	9781479960682
DOI	10.1109/HOLM.2014.7031033
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2014-10-12
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Resists Contact resistance Three-dimensional displays Gray-scale Electrical resistance measurement Surface resistance
Content Type	Text
Resource Type	Article

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