NDLI: Transport of a vacuum arc plasma beam through the aperture of an annular anode

Content Provider	IEEE Xplore Digital Library
Author	Zhitomirsky, V.N. Boxman, R.L. Goldsmith, S.
Copyright Year	2004
Description	Author affiliation: Electrical Discharge and Plasma Laboratory, Tel-Aviv University, POB 39040, Tel-Aviv 69978, Israel (Zhitomirsky, V.N.; Boxman, R.L.; Goldsmith, S.)
Abstract	The plasma beam produced by a vacuum are plasma source was injected into a cylindrical duct through an annular anode aperture. The plasma source consisted of a truncated cone shaped Cu cathode, and either a 20 mm thick annular Cu anode with aperture diameter, D, of 10, 17, 30, 40 or 50 mm, or 35 mm thick and D=40 or 50 mm. Magnetic coils positioned co-axially with the duct axis produced an approximately axial magnetic field guiding the plasma in the duct. The arc current, $I_{arc}$ was in the range of 30-100 A. A 130 mm diam. negatively biased planar disk probe, positioned normal to the duct axis at a distance of 150 mm from the anode exit, was used to measure ion saturation current, $I_{p},$ $I_{p},$ as well as the ion saturation current to the duct wall, $I_{d},$ the arc voltage, $V_{arc},$ and the probe and duct floating potentials with respect to the anode, ϕ $_{p}$ and ϕ $_{d}$ were measured as functions of D, $I_{arc}$ and the axial magnetic field B. Generally, $I_{p}$ and $I_{d}$ increased with D and $I_{arc},$ For D=10 mm, $I_{p}$ was ˜0.4% of $I_{arc},$ while with increasing D to 50 mm, $I_{p}$ reached ˜10% of $I_{arc}.$ However, at a large D the probability of the arc extinguishing increased. Both ϕ $_{p}$ and ϕ $_{d}$ were negative relative to the anode, and became increasingly negative with increasing D. With B small D, $I_{p}$ and $I_{d}$ increased almost linearly with B, while ϕ $_{d}$ was almost independent of B. However, for a large D, $I_{p}$ and $I_{d}$ were only slightly affected by B, and ϕ $_{d}$ became less negative with increasing B.
Starting Page	480
Ending Page	483
File Size	293507
Page Count	4
File Format	PDF
ISBN	078038461X
ISSN	10932941
DOI	10.1109/DEIV.2004.1422651
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2004-09-27
Publisher Place	Crimea
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Vacuum arcs Plasma transport processes Particle beams Apertures Anodes Plasma sources Ducts Magnetic field measurement Plasma measurements Probes
Content Type	Text
Resource Type	Article
Subject	Computer Networks and Communications Software

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