NDLI: Superposition of two plasma beams produced in a vacuum arc deposition apparatus

Content Provider	IEEE Xplore Digital Library
Author	Zhitomirsky, V.N. Boxman, R.L. Goldsmith, S. Grimberg, I. Weiss, B.Z.
Copyright Year	1998
Description	Author affiliation: Dept. of Electr. Discharge & Plasma Lab., Tel Aviv Univ., Israel (Zhitomirsky, V.N.)
Abstract	Two plasma beams of different materials were produced from Ti, Zr or Nb cathodes in a triple-cathode vacuum arc deposition apparatus. The cathodes were arranged in a circle centered on the system axis. The plasma produced was transported through a straight plasma duct with an axial magnetic field, into a deposition chamber, in which a single Langmuir probe, an array of probes, or a substrate could be mounted 560 mm from the cathode plane. The saturation ion current produced by one cathode, or by the simultaneous operation of two different cathodes, was measured in vacuum and in a 0.13-2.7 Pa nitrogen background. The spatial distribution of the composition of coatings deposited during simultaneous operation of different cathodes in nitrogen was also studied. It was shown that the ion current produced by each single cathode, and by the simultaneous operation of two cathodes, decreased by a factor of 20-100 when the nitrogen pressure was increased from vacuum to P=2.7 Pa. During simultaneous operation of two cathodes, the ion saturation current was less than the sum of the ion currents produced by each cathode individually when P<0.4 Pa, while the simultaneous ion current was less than the sum of the individual ion currents when P/spl ges/20.4 Pa.
Starting Page	609
Ending Page	612
File Size	344790
Page Count	4
File Format	PDF
ISBN	0780339533
ISSN	10932941
DOI	10.1109/DEIV.1998.738785
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1998-08-17
Publisher Place	Netherlands
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Particle beams Vacuum arcs Cathodes Plasma materials processing Plasma transport processes Nitrogen Magnetic field measurement Probes Magnetic materials Zirconium
Content Type	Text
Resource Type	Article
Subject	Computer Networks and Communications Software

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