NDLI: Manufacturing implementation of corona oxide silicon (COS) systems for diffusion furnace contamination monitoring

Content Provider	IEEE Xplore Digital Library
Author	Cosway, R.G. Catmull, K.B. Horner, G. Letherer, B.
Copyright Year	1997
Description	Author affiliation: MOS12 Die Manuf., Motorola Inc., Chandler, AZ, USA (Cosway, R.G.)
Abstract	Maximizing production utilization of manufacturing tools is of vital importance to the economic health of a wafer fabrication facility; however, preventative maintenance and qualification is important to maintain the highest quality product from these tools. This imposes contradictory constraints on the time allocated to preventative maintenance qualification activities. For diffusion furnaces, the standard procedure is to utilize high-frequency capacitance-voltage (CV) measurements to assess the overall cleanliness of the quartzware. This requires an oxide to be grown in the furnace on test wafers usually without the presence of product. Following this, additional processing of these wafers is necessary to generate a structure which can be probed (electrode deposition, doping, pattern, and etch) and some type of furnace cleaning cycle is run for each boat in the system. Depending upon the type of furnace, the total time that product cannot be run can amount to one day and, depending on the qualification cycle, this hit in manufacturing time can occur each week, every two weeks, or every month. Once the furnace returns to manufacturing for running production, an additional delay is encountered prior to learning the outcome of the CV results potentially resulting in material being run through the furnace out of specification. By utilizing a state-of-the-art Corona Oxide Semiconductor (COS) system for furnace qualifications, we have been able to cut our qualification time from 26.5 hours to 2.5 hours per week and have effectively increased our furnace capacity.
Starting Page	98
Ending Page	102
File Size	528641
Page Count	5
File Format	PDF
ISBN	0780340507
ISSN	10788743
DOI	10.1109/ASMC.1997.630714
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1997-09-10
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Manufacturing Corona Silicon Furnaces Qualifications Production Preventive maintenance Fabrication Time factors Measurement standards
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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