NDLI: Magnetoresistance and Magnetic Properties of Co(tCo)/Cu Multilayer Films

Content Provider	IEEE Xplore Digital Library
Author	Rizal, C.
Copyright Year	1965
Abstract	The paper reports on the magnetoresistance (MR) effect of ferromagnetic Co(tCo)/Cu multilayer films grown with pulse electrochemical deposition on top of a thin conducting layer of copper (15 nm). The copper buffer layer was grown on a polyamide substrate (1.69 cm²) and annealed. A strain was applied mechanically to study the MR effect and magnetic characteristics as a function of the Co layer thickness. The induced uniaxial magnetic anisotropy was observed due to the effect of strain in all the multilayer films. The multilayer [Co 1.0 nm/Cu 1.5 nm]₅₀ showed a minimum hysteresis loss. The MR ratio was ~ 3.4% at 1 kOe. A remarkable difference of magnetoresistance ratio was observed, corresponding to the orientation of magnetization curves.
Sponsorship	IEEE Magnetics Society
Starting Page	2394
Ending Page	2396
Page Count	3
File Size	224987
File Format	PDF
ISSN	00189464
Volume Number	46
Issue Number	6
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-06-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Magnetoresistance Magnetic properties Magnetic multilayers Magnetic films Copper Magnetic field induced strain Magnetic anisotropy Conductive films Buffer layers Annealing pulse electrodeposition Anisotropy Co(tCo)/Cu magnetoresistance effect multilayer
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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