NDLI: Transmission of light through slit apertures in metallic films

Content Provider	IEEE Xplore Digital Library
Author	Mansuripur, M. Yong Xie Zakharian, A.R. Moloney, J.V.
Copyright Year	1965
Abstract	Transmission of polarized light through subwavelength slit apertures is studied based on the electromagnetic field distributions obtained in finite difference time domain computer simulations. The results show the existence of a cutoff for E/sub /spl par// and a strong transmission (with no cutoff) for E/sub /spl perp//, where /spl par/ and /spl perp/ refer to the direction of the incident E-field relative to the long axis of the slit. Interference between the charges and currents induced in the vicinity of two adjacent slits is shown to result in enhanced transmission through both slits when the slits are separated by about one- half of one wavelength.
Sponsorship	IEEE Magnetics Society
Starting Page	1012
Ending Page	1015
Page Count	4
File Size	513548
File Format	PDF
ISSN	00189464
Volume Number	41
Issue Number	2
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-02-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Apertures Optical films Finite difference methods Gratings Lighting Optical scattering Two dimensional displays Optical microscopy Optical surface waves Optical polarization optics Diffraction electromagnetic scattering
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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