NDLI: Magnetic properties of ion beam sputtered Co-Zr and Co-Zr-Re amorphous films

Content Provider	IEEE Xplore Digital Library
Author	Tago, A. Nishimura, C. Yanagisawa, K.
Copyright Year	1965
Abstract	In this paper, the optimum deposition conditions of amorphous Co-Zr films fabricated by ion beam sputtering and their magnetic properties are investigated. The amorphous state is achieved at a low Zr content ( near 5 - 10 at% ) and is dependent on the substrate temperature. Co-Zr alloy films with a Zr content of 4.5 at% become amorphous on a -130 °C substrate, whereas a Zr content of more than 6 at% is necessary to obtain amorphous films on a 40 °C substrate. The resistivity of the films increases monotonically with Zr content or as the substrate temperature decreases from +300 °C to -130 °C. It is shown that the addition of a small amount of Re to the films decreases magnetostriction, although it lowers saturation magnetization slightly. A magnetostriction value of less than 10^-7is obtained when 2 to 3 at%Re is added to the Co-Zr films with a 6 to 8 at%Zr. Ion beam sputtered Co-6 at %Zr-2at% Re in 1 to 3 μm thick amorphous films exhibits the following excellent properties: a saturation magnetization of more than 13 kG, a permeability at 10 MHz of more than 5000, and a Vickers hardness of over 700.
Sponsorship	IEEE Magnetics Society
Starting Page	2032
Ending Page	2034
Page Count	3
File Size	295033
File Format	PDF
ISSN	00189464
Volume Number	21
Issue Number	5
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1985-09-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Magnetic properties Ion beams Amorphous materials Magnetic films Zirconium Magnetostriction Saturation magnetization Sputtering Temperature dependence Conductivity
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Deposition of amorphous Co-Ta and Co-Zr thin films by means of double ion beam sputtering

Magnetic Properties of Amorphous Co-Zr-Pd and Co-Hf-Pd Films

Magnetic properties of CoZr amorphous films prepared by low energy ion beam sputtering

Magnetostriction of sputtered Sm-Fe thin films

Magnetic and microwave resonance characterization of ion beam sputtered amorphous Fe/sub x/Ni/sub 80-x/B/sub 15/Si/sub 5/ films

Magnetic properties and influence of nitrogen in sputtered TbFeCo films

Electronic and magneto-optical properties of ion beam sputtered rare earth-FeCo thin films

Magnetic properties of zero magnetostriction Co-Ta-Zr amorphous alloy films deposited by RF sputtering

Magnetic properties of (Fe, Co and Ni) - Zr amorphous alloys

Magnetic properties of ion beam sputtered Co-Zr and Co-Zr-Re amorphous films

Similar Documents

Deposition of amorphous Co-Ta and Co-Zr thin films by means of double ion beam sputtering

Magnetic Properties of Amorphous Co-Zr-Pd and Co-Hf-Pd Films

Magnetic properties of CoZr amorphous films prepared by low energy ion beam sputtering

Magnetostriction of sputtered Sm-Fe thin films

Magnetic and microwave resonance characterization of ion beam sputtered amorphous Fe/sub x/Ni/sub 80-x/B/sub 15/Si/sub 5/ films

Magnetic properties and influence of nitrogen in sputtered TbFeCo films

Electronic and magneto-optical properties of ion beam sputtered rare earth-FeCo thin films

Magnetic properties of zero magnetostriction Co-Ta-Zr amorphous alloy films deposited by RF sputtering

Magnetic properties of (Fe, Co and Ni) - Zr amorphous alloys

Magnetic properties of ion beam sputtered Co-Zr and Co-Zr-Re amorphous films