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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Jae-Hoon Lee Jae-Hyun Jeong Jung-Hee Lee |
| Copyright Year | 1980 |
| Abstract | AlGaN/GaN Schottky barrier diodes (SBDs) with and without the in situ silicon carbon nitride (SiCN) cap layer were investigated. The fabricated SBD with the SiCN cap layer exhibited improved electrical characteristics, such as the forward turn-on voltage of about 0.7 V, the forward current of 4.1 A at 1.5 V, and the reverse breakdown voltage of 630 V, as compared with the corresponding values of 0.8 V, 3.8 A, and 580 V for the reference SBD without the SiCN cap layer. This improvement in the device performance of the SiCN-SBD is because the in situ SiCN cap layer not only lowers the barrier height but also effectively passivates the surface of the device with better surface morphology. |
| Sponsorship | IEEE Electron Devices Society |
| Starting Page | 492 |
| Ending Page | 494 |
| Page Count | 3 |
| File Size | 354671 |
| File Format | |
| ISSN | 07413106 |
| Volume Number | 33 |
| Issue Number | 4 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2012-04-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Aluminum gallium nitride Gallium nitride Surface morphology Leakage current Passivation Schottky barriers silicon carbon nitride (SiCN) cap layer AlGaN/GaN in situ leakage current Schottky barrier diodes (SBDs) |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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