NDLI: In-line Inspection Impact on Cycle Time and Yield

Content Provider	IEEE Xplore Digital Library
Author	Tirkel, I. Reshef, N. Rabinowitz, G.
Copyright Year	1988
Abstract	The semiconductor industry constantly drives for high yield and low cycle time (CT), while most current manufacturing practices consider them separately. This research investigates and exhibits the relationship between CT and yield as affected by in-line metrology inspections of production lots. Among the various factors that impact the tradeoff between CT and yield, we focus on single operation monitors and investigate their measure rate and scheduling. The research assumes a simplified production cell consisting of three operation steps that represent a typical segment in a production line. We compose and apply dynamic policies for metrology inspections via simulation and analytical methods. The aim is to concurrently reduce the CT accumulated and increase the yield achieved due to inspections. Ten inspection policies are compared under nine different operation scenarios. The results of most of the policies present a concave curve of yield versus CT. The curve illustrates that growing inspection rate increases both yield and CT until the yield reaches a maximum and then starts to decline. The cause for the yield decline is longer delay in corrective feedback to an out-of-control production tool due to longer waiting time for inspection. A cost-benefit CT-yield objective function is defined and demonstrates that the newly composed dynamic inspection policies are superior to the commonly used fixed measure rate policy. Future research could relax part of the simplified production cell assumptions in order to consider more realistic model structure and scenarios.
Sponsorship	IEEE Electron Devices Society IEEE Components, Packaging, and Manufacturing Technology Society IEEE Reliability Society IEEE Solid-State Circuits Society
Starting Page	491
Ending Page	498
Page Count	8
File Size	885445
File Format	PDF
ISSN	08946507
Volume Number	22
Issue Number	4
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2009-11-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Inspection Production Throughput Metrology Semiconductor device modeling Fabrication Time measurement Capacity planning Electronics industry Semiconductor device manufacture yield Cycle time inspections wafer fabrication
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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