NDLI: Tuning the Magnetization Dynamics in Sputtered <formula formulatype=inline><tex Notation=TeX>${hbox{Co}}_{2}{hbox{FeAl}}_{0.5}{hbox{Si}}_{0.5}$</tex> </formula> Heusler Alloy Thin Film by Gas Pressure

Content Provider	IEEE Xplore Digital Library
Author	Lichuan Jin Huaiwu Zhang Xiaoli Tang Feiming Bai Zhiyong Zhong
Copyright Year	1965
Abstract	The influences of sputtering gas pressure on the high frequency magnetization dynamics properties of sputtered Co₂FeAl_0.5Si_0.5 (CFAS) Heusler alloy thin films have been systematic studied. Results show that the surface roughness, grain size, anisotropy field and dynamic magnetic properties can be tailored by changing sputtering gas pressures. The inhomogeneous linewidth broadening of the sputtered CFAS Heusler thin films is monotonously enhanced with the pressure increasing, similar as with the anisotropy field. A low value intrinsic damping parameter is extracted as 0.0073 with a low sputtering pressure, 1.58 ×10^-4 mbar. The intrinsic damping parameter increases monotonously up to 0.0122 with the pressure increasing. The high tunability of the damping constant indicates that controlling the sputtering gas pressure could be an effective method to tune the magnetization dynamics in sputtered CFAS thin film.
Sponsorship	IEEE Magnetics Society
Starting Page	1
Ending Page	4
Page Count	4
File Size	906629
File Format	PDF
ISSN	00189464
Volume Number	50
Issue Number	1
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2014-01-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Magnetic resonance Sputtering Anisotropic magnetoresistance Damping Metals Perpendicular magnetic anisotropy intrinsic damping constant Co-based Heusler alloy thin films dynamic magnetic property external inhomogeneous broadening ferromagnetic resonance linewidth
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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