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Controlled in situ etch-back
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Author | Mattauch, R. J. |
| Copyright Year | 1981 |
| Description | A controlled in situ etch-back technique is disclosed in which an etch melt and a growth melt are first saturated by a source-seed crystal and thereafter etch-back of a substrate takes place by the slightly undersaturated etch melt, followed by LPE growth of a layer by the growth melt, which is slightly supersaturated. |
| File Size | 502963 |
| Page Count | 5 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19830012518 |
| Archival Resource Key | ark:/13960/t94796s80 |
| Language | English |
| Publisher Date | 1981-11-20 |
| Access Restriction | Open |
| Subject Keyword | Solid-state Physics Crystal Growth Liquid Phase Epitaxy Supersaturation Etching Melts Crystal Growth Substrates Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Patent |
