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Automated semiconductor diffusion and oxidation facility
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Copyright Year | 1982 |
| Description | A semiconductor diffusion and oxidation facility (totally automated) was developed. Wafers arrived on an air track, automatically loaded into a furnace tube, processed, returned to track, and sent on to the next process. The entire process was controlled by a computer. |
| File Size | 729725 |
| Page Count | 9 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19820012385 |
| Archival Resource Key | ark:/13960/t6741m15p |
| Language | English |
| Publisher Date | 1982-01-01 |
| Access Restriction | Open |
| Subject Keyword | Inorganic And Physical Chemistry Thermal Diffusion Depersonalization Phosphorus Surface Finishing Boron Semiconducting Films Semiconductors Materials Sintering Automatic Control Oxidation Coating Diffusion Deposition Ntrs Nasa Technical Reports ServerĀ (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Technical Report |