NDLI: Control of Adiabatic Liquid/Vapor Flow Utilizing EHD Conduction Pumping Mechanism

Content Provider	The American Society of Mechanical Engineers (ASME) Digital Collection
Author	Feng, Yinshan Seyed-Yagoobi, Jamal
Copyright Year	2004
Abstract	Unlike the electrohydrodynamic (EHD) induction and iondrag pumping, the conduction pumping is associated with the heterocharge layers of finite thickness in the vicinity of the electrodes which are based on the process of dissociation of the neutral electrolytic species and recombination of the generated ions. The conduction term here represents a mechanism for electric current flow in which charged carriers are produced not by injection from electrodes, but by dissociation of molecules within the fluid. This paper presents the control of adiabatic two-phase (liquid/vapor) flow distribution with EHD conduction pumping mechanism at two mass flux levels, Gtotal = 50 kg/m2s and Gtotal = 100 kg/m2s. The effects of the vapor quality, ranging from 0 to 26%, on the EHD conduction pumping have also been experimentally investigated. The measured pressure data show that the EHD conduction pumping can significantly decrease the pressure drop of the two-phase flow. It is also found that the performances of the EHD conduction pump are related to the mass flux and quality of two-phase flow.
Sponsorship	Heat Transfer Division
Starting Page	493
Ending Page	500
Page Count	8
File Format	PDF
ISBN	079184711X
DOI	10.1115/IMECE2004-59345
Volume Number	Heat Transfer, Volume 2
Conference Proceedings	ASME 2004 International Mechanical Engineering Congress and Exposition
Language	English
Publisher Date	2004-11-13
Publisher Place	Anaheim, California, USA
Access Restriction	Subscribed
Subject Keyword	Ehd Flow control Conduction Evaporator Mal-distribution Heat conduction Flow (dynamics) Vapors
Content Type	Text
Resource Type	Article

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