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| Content Provider | ACM Digital Library |
|---|---|
| Author | Chang, Yao-Wen Su, Yu-Hsuan |
| Abstract | One-dimensional nanowires are one of the most promising next-generation lithography technologies for 7 nm process node and beyond. The 1D nanowire process first constructs a 1D nanoarray through template synthesis followed by line-end cutting with additional cut masks. To achieve better yield and manufacturability, the cut patterns shall satisfy specified restricted design rules, and thus it is desirable to develop a novel routing methodology to better address the challenges arising from cut patterns. In this paper, we propose the first nanowire-aware routing system, called NWR, considering high cut-mask complexity based on a two-pass, bottom-up multilevel routing framework. Experimental results show that our nanowire-aware router can effectively and efficiently reduce cut numbers, cut spacing violations, and line-end extension length. |
| Starting Page | 1 |
| Ending Page | 6 |
| Page Count | 6 |
| File Format | |
| ISBN | 9781450335201 |
| DOI | 10.1145/2744769.2744874 |
| Language | English |
| Publisher | Association for Computing Machinery (ACM) |
| Publisher Date | 2015-06-07 |
| Publisher Place | New York |
| Access Restriction | Subscribed |
| Subject Keyword | Cut mask Routing Manufacturability Nanowires |
| Content Type | Text |
| Resource Type | Article |
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