NDLI: A high accuracy femto-/picosecond laser damage test facility dedicated to the study of optical thin films.

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Improving metastable impact electron spectroscopy and ultraviolet photoelectron spectroscopy signals by means of a modified time-of-flight separation.

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A high accuracy femto-/picosecond laser damage test facility dedicated to the study of optical thin films.

Content Provider	World Health Organization (WHO)-Global Index Medicus
Author	Commandré, M. Gallais, L. Lequime, M. Lemarchand, F. Zerrad, M. Mangote, B. Gao, L. H.
Description	Country affiliation: France Author Affiliation: Mangote B ( Institut Fresnel, CNRS, Aix-Marseille UniversiteÌ , Ecole Centrale Marseille, Marseille, France.)
Abstract	A laser damage test facility delivering pulses from 100 fs to 3 ps and designed to operate at 1030 nm is presented. The different details of its implementation and performances are given. The originality of this system relies the online damage detection system based on Nomarski microscopy and the use of a non-conventional energy detection method based on the utilization of a cooled CCD that offers the possibility to obtain the laser induced damage threshold (LIDT) with high accuracy. Applications of this instrument to study thin films under laser irradiation are presented. Particularly the deterministic behavior of the sub-picosecond damage is investigated in the case of fused silica and oxide films. It is demonstrated that the transition of 0-1 damage probability is very sharp and the LIDT is perfectly deterministic at few hundreds of femtoseconds. The damage process in dielectric materials being the results of electronic processes, specific information such as the material bandgap is needed for the interpretation of results and applications of scaling laws. A review of the different approaches for the estimation of the absorption gap of optical dielectric coatings is conducted and the results given by the different methods are compared and discussed. The LIDT and gap of several oxide materials are then measured with the presented instrument: Al(2)O(3), Nb(2)O(5), HfO(2), SiO(2), Ta(2)O(5), and ZrO(2). The obtained relation between the LIDT and gap at 1030 nm confirms the linear evolution of the threshold with the bandgap that exists at 800 nm, and our work expands the number of tested materials.
ISSN	00346748
Issue Number	1
Journal	Review of Scientific Instruments
Volume Number	83
e-ISSN	10897623
Language	English
Publisher	American Institute of Physics
Publisher Date	2012-01-01
Publisher Place	United States
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Discipline Physics Discipline Chemistry
Content Type	Text
Resource Type	Article
Subject	Medicine Instrumentation

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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Selective ablation of thin SiO2 layers on silicon substrates by femto- and picosecond laser pulses

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A high accuracy femto-/picosecond laser damage test facility dedicated to the study of optical thin films.

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A high accuracy femto-/picosecond laser damage test facility dedicated to the study of optical thin films.