NDLI: Novel one-component positive-tone chemically amplified i-line molecular glass photoresist based on tannic acid

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Novel one-component positive-tone chemically amplified i-line molecular glass photoresist based on tannic acid

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Chemical Research in Chinese Universities : Volume 31, Issue 3, June 2015

Chemical Research in Chinese Universities : Volume 31, Issue 2, April 2015

Chemical Research in Chinese Universities : Volume 31, Issue 1, February 2015

Chemical Research in Chinese Universities : Volume 30

Chemical Research in Chinese Universities : Volume 29

Novel one-component positive-tone chemically amplified i-line molecular glass photoresist based on tannic acid

Content Provider	Springer Nature Link
Author	Wei, Qi Wang, Liyuan
Copyright Year	2015
Abstract	Molecular glass resist has been considered as one of the best choices for a new generation of lithography. In this work, a new type of photoactive compound was obtained by the esterification of tannic acid with 2-diazo-1-naphthoquinone-4-sulfonyl chloride(2,1,4-DNQ-Cl) and ditertbutyl dicarbonate. The new obtained compound possessed both a photosensitive group of diazonaphthoquinone sulfonate(2,1,4-DNQ) and a group of acidolytic protection. Upon the irradiation of the compound under 365 nm light, the former group was photolyzed and converted into indene carboxylic acid along with a small amount of sulfonic acid, which could lead to the deprotection of the latter group. As a result, a novel i-line molecular glass photoresist was formed with the chemical modification of tannic acid. The experimental results show that the modificated compound had a fair solubility in many organic solvents. The lithographic performance of the resist was evaluated on an i-line exposure system with high photosensitivity and resolution as well.
Starting Page	585
Ending Page	589
Page Count	5
File Format	PDF
ISSN	10059040
Journal	Chemical Research in Chinese Universities
Volume Number	31
Issue Number	4
e-ISSN	22103171
Language	English
Publisher	Jilin University and The Editorial Department of Chemical Research in Chinese Universities
Publisher Date	2015-07-10
Publisher Place	Changchun
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Tannic acid Chemistry/Food Science Analytical Chemistry Chemically amplified Physical Chemistry 2,1,4-Diazonaphthoquinone(DNQ) sulfonate Inorganic Chemistry I-Line resist Organic Chemistry
Content Type	Text
Resource Type	Article
Subject	Chemistry Education

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