NDLI: Room temperature, ion energy-controlled deposition of silicon nitride films in a SiH$_{4}$-N$

Content Provider	Springer Nature Link
Author	Kim, Byungwhan Kwon, Minji Seo, Yong Ho
Copyright Year	2010
Abstract	In this study, silicon nitride films were deposited in SiH$_{4}$-N$_{2}$ plasma using a plasma-enhanced chemical vapor deposition system at room-temperature. The radio frequency bias power impact on the films characteristics (deposition rate, refractive index, and surface roughness) was examined. Ion energy information (energy level, energy flux) collected using an ion energy analysis system was correlated with the film characteristics. Increasing the bias power increased the ion energy, more noticeably with the high ion energy. For the same variations in the bias power, the ion energy flux initially decreased considerably and then varied little. A similar variation was noticed in both film characteristics. Both the deposition rate and the refractive index were strongly correlated with the ratio of high ion energy to low ion energy rather than high or low ion energy. A similar dependency was also observed for the refractive index. The dependency of surface roughness changed from ion energy to ion energy flux. The roles of the ion energy flux were further examined by implicating them in AFM images. The low ion energy flux was identified as a contributor to the extreme peaks that significantly deteriorated the surface roughness. The highest deposition rate, highest refractive index, and smallest surface roughness obtained were 183 Å/min, 2.06, and 0.230 nm, respectively.
Starting Page	621
Ending Page	625
Page Count	5
File Format	PDF
ISSN	15989623
Journal	Metals and Materials
Volume Number	16
Issue Number	4
e-ISSN	20054149
Language	English
Publisher	The Korean Institute of Metals and Materials
Publisher Date	2010-08-26
Publisher Place	Springer
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	ceramics solar cells thin films coating plasma deposition/spray Continuum Mechanics and Mechanics of Materials Characterization and Evaluation of Materials Engineering Thermodynamics, Heat and Mass Transfer Magnetism, Magnetic Materials Operating Procedures, Materials Treatment Metallic Materials
Content Type	Text
Resource Type	Article
Subject	Materials Chemistry Mechanics of Materials Metals and Alloys Condensed Matter Physics

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Growth of silicon nitride film by controlling plasma ion energy and duty ratio at room temperature

Radio frequency bias power effects on silicon nitride film deposited in SiH$_{4}$-NH$_{3}$ using a plasma-enhanced chemical vapor deposition

Structural and nano-mechanical properties of nanostructured diamond-like carbon thin films

Room-temperature high radio-frequency source power effects on silicon nitride films deposited by using a plasma-enhanced chemical vapor deposition

Coating of Ni powders through micronozzle in a nano particle deposition system

Use of a neural network to characterize the charge density of PECVD-silicon nitride films

Fabrication of porous lanthanum strontium manganite films by electrostatic spray deposition

Corrosion behavior in a 3.5 wt% NaCl solution of amorphous coatings prepared through plasma-spray and cold-spray coating processes

Synthesis of cubic boron nitride thin films by low-energy ion beam assisted deposition by applying substrate bias

Room temperature, ion energy-controlled deposition of silicon nitride films in a SiH$_{4}$-N$_{2}$ plasma

Similar Documents

Growth of silicon nitride film by controlling plasma ion energy and duty ratio at room temperature

Radio frequency bias power effects on silicon nitride film deposited in SiH$_{4}$-NH$_{3}$ using a plasma-enhanced chemical vapor deposition

Structural and nano-mechanical properties of nanostructured diamond-like carbon thin films

Room-temperature high radio-frequency source power effects on silicon nitride films deposited by using a plasma-enhanced chemical vapor deposition

Coating of Ni powders through micronozzle in a nano particle deposition system

Use of a neural network to characterize the charge density of PECVD-silicon nitride films

Fabrication of porous lanthanum strontium manganite films by electrostatic spray deposition

Corrosion behavior in a 3.5 wt% NaCl solution of amorphous coatings prepared through plasma-spray and cold-spray coating processes

Synthesis of cubic boron nitride thin films by low-energy ion beam assisted deposition by applying substrate bias

Room temperature, ion energy-controlled deposition of silicon nitride films in a SiH$_{4}$-N$_{2}$ plasma