NDLI: Organic/inorganic multilayer thin film encapsulation via initiated chemical vapor deposition and atomic layer deposition for its application to organic solar cells

Content Provider	Springer Nature Link
Author	Kim, Bong Jun Han, Donggeon Yoo, Seunghyup Im, Sung Gap
Copyright Year	2017
Abstract	A thin film encapsulation (TFE) was fabricated by alternating deposition of organic and inorganic layers via initiated chemical vapor deposition (iCVD) and atomic layer deposition (ALD). A highly crosslinked organosilicone polymer, poly(1,3,5-trimethyl-1,3,5-trivinylcyclotrisiloxane) (pV3D3) was successfully adopted as the organic layer for the fabrication of TFE. The film formed a stable and smooth interface with ALD Al$_{2}$O$_{3}$ layer. The multilayer TFE consisting of pV3D3 and Al$_{2}$O$_{3}$ alternating layers exhibited outstanding optical transparency as well as excellent barrier property. Finally, the multilayer TFE was applied monolithically to organic solar cells (OSCs), and the shelf life of the cells was increased immensely, suggesting that the developed organic/inorganic multilayer TFE is an efficient barrier film for elongating the lifetime of organic electronics.
Starting Page	892
Ending Page	897
Page Count	6
File Format	PDF
ISSN	02561115
Journal	Korean Journal of Chemical Engineering
Volume Number	34
Issue Number	3
e-ISSN	19757220
Language	English
Publisher	Springer US
Publisher Date	2016-12-13
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Initiated Chemical Vapor Deposition (iCVD) Atomic Layer Deposition (ALD) Thin Film Encapsulation (TFE) Barrier Organic Solar Cells (OSCs) Industrial Chemistry/Chemical Engineering Catalysis Materials Science Biotechnology
Content Type	Text
Resource Type	Article
Subject	Chemistry Chemical Engineering

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