NDLI: WO$_{3}$ oxide film formation on tungsten in O$_{2}$/H$

Content Provider	Springer Nature Link
Author	Gorodetsky, A. E. Zalavutdiv, R. Kh. Bukhovets, V. L. Kazansky, L. P. Zakharov, A. P.
Copyright Year	2013
Abstract	The features of tungsten oxidation in a flowing O$_{2}$ or O$_{2}$/H$_{2}$ mixture glow discharge with a hollow cathode are investigated in the cathode, plasma, and afterglow regions at T = 300–350 K. The structure and composition of the samples are analyzed via reflection high-energy electron diffraction, reflection X-ray diffraction, electron probe microanalysis, and X-ray photoelectron spectroscopy. The results of analysis show that the metal surface is covered by a thin film (5–10 nm thick) of amorphous porous hydrated tungsten oxide (WO$_{3}$) after its exposure to the discharge and storage in air. The study of the film composition using a time-of-flight mass spectrometer indicates that the WO$_{3}$ film contains (WO$_{3}$)$_{ n }$ (n = 1–6) clusters and water molecules adsorbed in the pores. After exposure of the polycrystals to the O$_{2}$/H$_{2}$ discharge, the selective intense oxidation of individual grains is detected in the cathode region; the surrounding areas are subjected to weaker oxidation. The thicknesses of the WO$_{3}$ films on neighbouring grains differ by more than tenfold. Such grains can be the source of tungsten dust in plasma installations.
Starting Page	1173
Ending Page	1182
Page Count	10
File Format	PDF
ISSN	10274510
Journal	Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
Volume Number	7
Issue Number	6
e-ISSN	18197094
Language	English
Publisher	Pleiades Publishing
Publisher Date	2014-02-07
Publisher Place	Moscow
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Surfaces and Interfaces, Thin Films
Content Type	Text
Resource Type	Article
Subject	Nanoscience and Nanotechnology Surfaces, Coatings and Films

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