NDLI: Peculiarities of the initial stage of growth of niobium-based nanostructures on a Si(111)-7 × 7 surface

Content Provider	Springer Nature Link
Author	Putilov, A. V. Muzychenko, D. A. Aladyshkin, A. Yu.
Copyright Year	2016
Abstract	The initial stage of growth of nanoislands prepared by thermal deposition of niobium on the reconstructed surface of Si(111)-7 × 7 in ultrahigh vacuum is experimentally investigated. The morphological and electrophysical properties of niobium-based nanostructures are studied by means of low-temperature scanning tunneling microscopy and spectroscopy. It is found that upon the deposition of niobium on a substrate at room temperature, clusters and nanoislands are formed on the silicon surface, having a characteristic lateral size of 10 nm with the metallic type of tunneling conductivity at low temperatures. Upon the deposition of niobium on a heated substrate, quasi-one-dimensional (1D) and quasi-two-dimensional (2D) structures with typical lateral dimensions of up to 200 nm and three-dimensional pyramidal islands with semiconducting type of tunneling conductivity at low temperatures are formed.
Starting Page	273
Ending Page	281
Page Count	9
File Format	PDF
ISSN	10274510
Journal	Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
Volume Number	10
Issue Number	2
e-ISSN	18197094
Language	English
Publisher	Pleiades Publishing
Publisher Date	2016-05-15
Publisher Place	Moscow
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	scanning tunneling microscopy niobium-based nanostructures thermal deposition island nanostructures Surfaces and Interfaces, Thin Films
Content Type	Text
Resource Type	Article
Subject	Nanoscience and Nanotechnology Surfaces, Coatings and Films

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