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| Content Provider | Springer Nature Link |
|---|---|
| Author | Smirv, D. V. Boltar, K. O. Sednev, M. V. Sharov, Yu. P. |
| Copyright Year | 2016 |
| Abstract | Mesaelements of the focal plane array (FPA) of p–i–n diodes based on Al$_{ x }$Ga$_{1–x }$N for p–i–n heteroepitaxial structures (HESs) grown by the molecular-beam epitaxy and hydride epitaxy methods with the use of metalorganic compounds are formed. Elements of 320 × 256 FPAs with a pitch of 30 μm are separated by means of ion-beam etching through a photoresist mask in the argon ion stream produced by the Kaufmann ion source in a vacuum plant. To determine the required etching depth, contact profilometry and ultraviolet spectrophotometry methods allowing one to determine positions of the n-layer and sufficient etching depth of the sample are used. The thickness accuracy of the HES functional layers stated in manufacturer’s certificates does not exceed 28%. Rates of ion-beam etching of Al$_{ x }$Ga$_{1–x }$N for p–i–n layers with different compositions are determined. |
| Starting Page | 358 |
| Ending Page | 362 |
| Page Count | 5 |
| File Format | |
| ISSN | 10642269 |
| Journal | Journal of Communications Technology and Electronics |
| Volume Number | 61 |
| Issue Number | 3 |
| e-ISSN | 15556557 |
| Language | English |
| Publisher | Pleiades Publishing |
| Publisher Date | 2016-04-05 |
| Publisher Place | Moscow |
| Access Restriction | One Nation One Subscription (ONOS) |
| Subject Keyword | Al$_{ x }$Ga$_{1–x }$N for p–i–n GaN heteroepitaxial structures p–i–n diode ion-beam etching visible-blind subband solar-blind subband absorption (transmission) edge Communications Engineering, Networks |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Condensed Matter Physics Electrical and Electronic Engineering Radiation |
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