NDLI: Enhanced growth of crystalline-amorphous core-shell silicon nanowires by catalytic thermal CVD using in situ generated tin catalyst

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Enhanced growth of crystalline-amorphous core-shell silicon nanowires by catalytic thermal CVD using in situ generated tin catalyst

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Enhanced growth of crystalline-amorphous core-shell silicon nanowires by catalytic thermal CVD using in situ generated tin catalyst

Content Provider	Springer Nature Link
Author	Cheng, ShiMin Ren, Tong Ying, PinLiang Yu, Rui Zhang, WenHua Zhang, Jian Li, Can
Copyright Year	2012
Abstract	In this work, we prepared silicon nanowires (Si NWs) on both fluorine-doped SnO$_{2}$ (FTO) coated glass substrate and common glass substrate by catalytic thermal chemical vapor deposition (CVD) using indium film as the catalyst. It is confirmed that indium can catalyze the growth of Si NWs. More importantly, we found that tin generated in situ from the reduction of SnO$_{2}$ by indium can act as catalyst, which greatly enhances the growth of Si NWs on FTO substrate. The obtained Si NWs have a uniform crystalline-amorphous core-shell structure that is formed via vapor-liquid-solid and vapor-solid growth of silicon sequentially. This work provides a strategy to prepare Si NWs in high yield by catalytic thermal CVD using the low melting point metal catalysts.
Starting Page	2573
Ending Page	2579
Page Count	7
File Format	PDF
ISSN	16747291
Journal	Science in China Series B: Chemistry
Volume Number	55
Issue Number	12
e-ISSN	18691870
Language	English
Publisher	SP Science China Press
Publisher Date	2012-08-14
Publisher Place	Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	crystalline-amorphous core-shell silicon nanowires catalytic thermal CVD in situ tin catalyst indium catalyst Chemistry/Food Science
Content Type	Text
Resource Type	Article
Subject	Chemistry

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