NDLI: Creation of Polymerizable Species in Plasma Polymerization

Content Provider	Springer Nature Link
Author	Yasuda, Hirotsugu Yu, Qingsong
Copyright Year	2004
Abstract	Plasma polymerization of trimethylsilane (TMS) was carried out and investigated in a direct current (dc) glow discharge. The formation of TMS plasma glow was carefully examined with optical photography as compared with an Ar dc glow discharge. It was found that there exists a significant difference in the nature of glow and how the glow is created in TMS glow discharge, which polymerizes or causes deposition, and that of monatomic gas such as Ar, which does not polymerize or deposit. In dc Ar discharge, the negative glow, which is the most luminous zone in the discharge, develops in a distinctive distance away from the cathode surface, and the cathode remains in the dark space. In a strong contrast to this situation, in TMS dc discharge, the primary glow that is termed as cathode-glow in this paper appears at cathode surface, while a much weaker negative glow as a secondary glow was observed at the similar location to where the Ar negative glow appears. The deposition results of plasma polymers and gas phase composition data of TMS in a closed reactor acquired by ellipsometry and residual gas analyzer (RGA) measurements clearly indicated that the cathode-glow in TMS glow discharge is mainly associated with chemically reactive species that would polymerize or form deposition, but the negative glow is related to species from simple gases that would not polymerize or deposit. Based on the glow location with respect to the cathode, it was deduced that the cathode-glow is due to photon emitting species created by molecular dissociation of the monomer that is caused by low energy electrons emanating from the cathode surface. The negative glow is due to the ionization and the formation of excited neutrals of fragmented atoms caused by high-energy electrons. Polymerizable species that would cause deposition of material (plasma polymers) are created mainly by the fragmentation of monomer molecules by low energy electrons, but not by electron-impact ionization of the monomer.
Starting Page	325
Ending Page	351
Page Count	27
File Format	PDF
ISSN	02724324
Journal	Plasma Chemistry and Plasma Processing
Volume Number	24
Issue Number	2
e-ISSN	15728986
Language	English
Publisher	Kluwer Academic Publishers-Plenum Publishers
Publisher Date	2004-01-01
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Inorganic Chemistry Characterization and Evaluation Materials Mechanics Nuclear Physics, Heavy Ions, Hadrons Mechanical Engineering
Content Type	Text
Resource Type	Article
Subject	Chemistry Surfaces, Coatings and Films Condensed Matter Physics Chemical Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

DC plasma polymerization of hexamethyldisiloxane

Polyfluorene Thin Films Synthesized by a Novel Plasma Polymerization Method

Anode Magnetron Enhanced DC Glow Discharge Processes for Plasma Surface Cleaning and Polymerization

Analytical Model of a Plasma Reactor

Plasma Destruction of Ozone Depleting Substances

Atmospheric Plasma Sterilization and Deodorization of Dielectric Surfaces

Gas-Phase Chemistry of Pulsed n-Hexane Discharge

Reduction of TiO$_{2}$ with Hydrogen Plasma

Acknowledgments ( Plasma Chemistry and Plasma Processing , Volume 25 , Issue 6 )

Creation of Polymerizable Species in Plasma Polymerization

Similar Documents

DC plasma polymerization of hexamethyldisiloxane

Polyfluorene Thin Films Synthesized by a Novel Plasma Polymerization Method

Anode Magnetron Enhanced DC Glow Discharge Processes for Plasma Surface Cleaning and Polymerization

Analytical Model of a Plasma Reactor

Plasma Destruction of Ozone Depleting Substances

Atmospheric Plasma Sterilization and Deodorization of Dielectric Surfaces

Gas-Phase Chemistry of Pulsed n-Hexane Discharge

Reduction of TiO$_{2}$ with Hydrogen Plasma

Acknowledgments ( Plasma Chemistry and Plasma Processing , Volume 25 , Issue 6 )

Creation of Polymerizable Species in Plasma Polymerization