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  1. Plasma Chemistry and Plasma Processing
  2. Plasma Chemistry and Plasma Processing : Volume 20
  3. Plasma Chemistry and Plasma Processing : Volume 20, Issue 1, March 2000
  4. Analytical Model of a Plasma Reactor
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Plasma Chemistry and Plasma Processing : Volume 37
Plasma Chemistry and Plasma Processing : Volume 36
Plasma Chemistry and Plasma Processing : Volume 35
Plasma Chemistry and Plasma Processing : Volume 34
Plasma Chemistry and Plasma Processing : Volume 33
Plasma Chemistry and Plasma Processing : Volume 32
Plasma Chemistry and Plasma Processing : Volume 31
Plasma Chemistry and Plasma Processing : Volume 30
Plasma Chemistry and Plasma Processing : Volume 29
Plasma Chemistry and Plasma Processing : Volume 28
Plasma Chemistry and Plasma Processing : Volume 27
Plasma Chemistry and Plasma Processing : Volume 26
Plasma Chemistry and Plasma Processing : Volume 25
Plasma Chemistry and Plasma Processing : Volume 24
Plasma Chemistry and Plasma Processing : Volume 23
Plasma Chemistry and Plasma Processing : Volume 22
Plasma Chemistry and Plasma Processing : Volume 21
Plasma Chemistry and Plasma Processing : Volume 20
Plasma Chemistry and Plasma Processing : Volume 20, Issue 4, December 2000
Plasma Chemistry and Plasma Processing : Volume 20, Issue 3, September 2000
Plasma Chemistry and Plasma Processing : Volume 20, Issue 2, June 2000
Plasma Chemistry and Plasma Processing : Volume 20, Issue 1, March 2000
Methyl Concentration Measurements During Microwave Plasma-Assisted Diamond Deposition
Efficient and Accurate Methods for the Computation of Thermodynamic and Transport Properties of Multitemperature Thermal Plasma. Part I: Thermodynamic and Heavy Particle Transport Properties
Analytical Model of a Plasma Reactor
Depolymerization of Polyethylene Using Induction-Coupled Plasma Technology
OES Use and Vaporization Modeling for Fly-Ash Plasma Vitrification
Kinetics of the Electrons in Striations of Spherical Glow Discharges
Microwave Diagnostics in Diffusive and Constricted Medium-Pressure Discharges
A Plasma-Activated Ni/α-Al2O3 Catalyst for the Conversion of CH4 to Syngas
Etching Efficiency for Si and SiO2 by CF+x, F+, and C+ Ion Beams Extracted from CF4 Plasmas
Remarks Relative to the Use of Atmospheric Plasma-Pulsed Discharge for PET Bottles Instant Sterilization
Obituary for Professor Mikhail F. Zhukov
Plasma Chemistry and Plasma Processing : Volume 19
Plasma Chemistry and Plasma Processing : Volume 18
Plasma Chemistry and Plasma Processing : Volume 17

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Analytical Model of a Plasma Reactor

Content Provider Springer Nature Link
Author Deam, R. T. Dayal, A. R.
Copyright Year 2000
Abstract This paper presents a simple analytical model to estimate the effect of theboundary layer on the performance of a dc plasma reactor. A graphite linerwas inserted inside the reactor to raise the wall temperature. The model wasused to predict the Destruction and Removal Efficiency (DRE) of the reactorwith and without the graphite liner. The DRE of the device was measured forboth conditions and was found to be in close agreement with the predictedvalues. The model has shown that the DRE is a strong function of the walltemperature of the flight tube and is insensitive to the change in thetube's diameter.
Starting Page 23
Ending Page 35
Page Count 13
File Format PDF
ISSN 02724324
Journal Plasma Chemistry and Plasma Processing
Volume Number 20
Issue Number 1
e-ISSN 15728986
Language English
Publisher Kluwer Academic Publishers-Plenum Publishers
Publisher Date 2000-01-01
Publisher Place New York
Access Restriction One Nation One Subscription (ONOS)
Subject Keyword Inorganic Chemistry Characterization and Evaluation Materials Mechanics Nuclear Physics, Heavy Ions, Hadrons Mechanical Engineering
Content Type Text
Resource Type Article
Subject Chemistry Surfaces, Coatings and Films Condensed Matter Physics Chemical Engineering
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