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| Content Provider | Springer Nature Link |
|---|---|
| Author | Ito, Haruhiko Koshimura, Katsuaki Onitsuka, Saori Okada, Kohtaro Suzuki, Tsuneo Akasaka, Hiroki Saitoh, Hidetoshi |
| Copyright Year | 2012 |
| Abstract | The dissociative excitation reaction of C$_{2}$H$_{2}$ with the electron-cyclotron resonance plasma of Ar was investigated based on the electrostatic-probe measurements and on the optical emission spectroscopy of the CH(A$^{2}$Δ–X$^{2}$Π) transition. The density, n $_{e}$, and the temperature, T $_{e}$, of free electrons were controlled by adding H$_{2}$O molecules externally into the reaction region, and the dependence of the CH(A$^{2}$Δ–X$^{2}$Π) emission intensity on the addition of H$_{2}$O was observed to compare with the evaluated dependencies based on n $_{e}$ and T $_{e}$. The mechanism of production of CH(A$^{2}$Δ) was found, predominantly, to be the electron impact with the contribution of 10–20% of the electron-impact dissociation of C$_{2}$H radicals; the contribution of the ion–electron recombination was negligible. Hydrogenated amorphous carbon films were fabricated using the same reaction system. The atomic compositions, Raman spectra, and the hardness of films were discussed in terms of the variations of n $_{e}$ and T $_{e}$ upon the addition of H$_{2}$O molecules. |
| Starting Page | 231 |
| Ending Page | 248 |
| Page Count | 18 |
| File Format | |
| ISSN | 02724324 |
| Journal | Plasma Chemistry and Plasma Processing |
| Volume Number | 32 |
| Issue Number | 2 |
| e-ISSN | 15728986 |
| Language | English |
| Publisher | Springer US |
| Publisher Date | 2012-02-19 |
| Publisher Place | Boston |
| Access Restriction | One Nation One Subscription (ONOS) |
| Subject Keyword | ECR plasma Optical emission spectrum C$_{2}$H$_{2}$ CH(A–X) transition Hydrogenated amorphous carbon Mechanics Characterization and Evaluation of Materials Inorganic Chemistry Mechanical Engineering Nuclear Physics, Heavy Ions, Hadrons |
| Content Type | Text |
| Resource Type | Article |
| Subject | Chemistry Surfaces, Coatings and Films Condensed Matter Physics Chemical Engineering |
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