NDLI: Properties of chemically-deposited nanocrystalline MoS$_{2}$ thin films

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Properties of chemically-deposited nanocrystalline MoS$_{2}$ thin films

Content Provider	Springer Nature Link
Author	Sathe, D. J. Chate, P. A. Sargar, S. B. Kite, S. V. Sande, Z. D.
Copyright Year	2015
Abstract	Molybdenum disulfide thin films have been deposited from an aqueous acidic bath using sodium thiosulphate as sulphide ion source. The various preparative parameters are optimized and growth mechanism is discussed. X-ray diffraction analysis reveals that the films are polycrystalline in nature with hexagonal structure. A microstructural study has been carried out by field emission scanning electron microscopy. EDAX analysis shows that the films are nearly stoichiometries of the Mo:S i.e. 1:2. Electrical conductivity was found to be in the order of 10$^{−5}$–10$^{−3}$ (Ω cm)$^{−1}$. From optical absorption studies the energy band gap of MoS$_{2}$ is estimated to be 1.7 eV.
Starting Page	3834
Ending Page	3838
Page Count	5
File Format	PDF
ISSN	09574522
Journal	Journal of Materials Science: Materials in Electronics
Volume Number	27
Issue Number	4
e-ISSN	1573482X
Language	English
Publisher	Springer US
Publisher Date	2016-01-02
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Optical and Electronic Materials Characterization and Evaluation of Materials
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Biomaterials Biophysics Condensed Matter Physics Electronic, Optical and Magnetic Materials Bioengineering Electrical and Electronic Engineering Biomedical Engineering

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