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  1. Journal of Materials Science: Materials in Electronics
  2. Journal of Materials Science: Materials in Electronics : Volume 10
  3. Journal of Materials Science: Materials in Electronics : Volume 10, Issue 2, April 1999
  4. Characterization of titanium polycide films by atomic force microscope
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Journal of Materials Science: Materials in Electronics : Volume 28
Journal of Materials Science: Materials in Electronics : Volume 27
Journal of Materials Science: Materials in Electronics : Volume 26
Journal of Materials Science: Materials in Electronics : Volume 25
Journal of Materials Science: Materials in Electronics : Volume 24
Journal of Materials Science: Materials in Electronics : Volume 23
Journal of Materials Science: Materials in Electronics : Volume 22
Journal of Materials Science: Materials in Electronics : Volume 21
Journal of Materials Science: Materials in Electronics : Volume 20
Journal of Materials Science: Materials in Electronics : Volume 19
Journal of Materials Science: Materials in Electronics : Volume 18
Journal of Materials Science: Materials in Electronics : Volume 17
Journal of Materials Science: Materials in Electronics : Volume 16
Journal of Materials Science: Materials in Electronics : Volume 15
Journal of Materials Science: Materials in Electronics : Volume 14
Journal of Materials Science: Materials in Electronics : Volume 13
Journal of Materials Science: Materials in Electronics : Volume 12
Journal of Materials Science: Materials in Electronics : Volume 11
Journal of Materials Science: Materials in Electronics : Volume 10
Journal of Materials Science: Materials in Electronics : Volume 10, Issue 9, December 1999
Journal of Materials Science: Materials in Electronics : Volume 10, Issue 8, November 1999
Journal of Materials Science: Materials in Electronics : Volume 10, Issue 7, September 1999
Journal of Materials Science: Materials in Electronics : Volume 10, Issue 5-6, July 1999
Journal of Materials Science: Materials in Electronics : Volume 10, Issue 4, June 1999
Journal of Materials Science: Materials in Electronics : Volume 10, Issue 3, May 1999
Journal of Materials Science: Materials in Electronics : Volume 10, Issue 2, April 1999
The piezoelectric properties and the stability of the resonant frequency in Mn–Cr Co-doped PSZT ceramics
Microstructural change and interfacial reactions of Pt/Ti thin films on SiN$_{x}$/Si during annealing in various ambients
Characterization of titanium polycide films by atomic force microscope
Reductive ion insertion into thin-film indium tin oxide (ITO) in aqueous acidic solutions: the effect of leaching of indium from the ITO
Superconductivity in the chromium-doped Tl-1212 phase (Tl$_{0.8}$M$_{0.2}$)Sr$_{2}$(Ca$_{1-x}$Cr$_{x}$)Cu$_{2}$O$_{7}$ (M=Bi and In)
Effects of annealing in O$_{2}$ and N$_{2}$ on the microstructure of metal organic chemical vapor deposition Ta$_{2}$O$_{5}$ film and the interfacial SiO$_{2}$ layer
Hydrazine method of synthesis of γ-Fe$_{2}$O$_{3}$ useful in ferrites preparation. Part III – study of hydrogen iron oxide phase in γ-Fe$_{2}$O$_{3}$
Hydrazine method of synthesis of γ-Fe$_{2}$O$_{3}$ useful in ferrites preparation. Part IV – preparation and characterization of magnesium ferrite, MgFe$_{2}$O$_{4}$ from γ-Fe$_{2}$O$_{3}$ obtained from hydrazinated iron oxyhydroxides and iron (II) carboxylato-hydrazinates
Criteria for uniform thin film formation for polymeric materials
Effect of the solution pH on the growth of spray-deposited CuInS$_{2}$ thin films
Negative-differential-resistance effects in amorphous CuInS$_{2}$ thin film
Minority carrier diffusion length in undoped p-type epitaxially grown Cd$_{x}$Hg$_{1-x}$Te
Diode R$_{0}$A in p-type epitaxially grown undoped Cd$_{x}$Hg$_{1-x}$Te
Journal of Materials Science: Materials in Electronics : Volume 10, Issue 1, March 1999
Journal of Materials Science: Materials in Electronics : Volume 9
Journal of Materials Science: Materials in Electronics : Volume 8

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Characterization of titanium polycide films by atomic force microscope

Content Provider Springer Nature Link
Author Umapathi, B. Lahiri, S. K. Kal, S.
Copyright Year 1999
Abstract Non-destructive methods are required for in-line process control in VLSI circuits. In this study, mean roughness values as obtained from AFM analysis have been used to follow phase transformation of Ti-polycide films formed by annealing Ti films on polysilicon. The results are supported from XRD analysis of the TiSi$_{2}$ films.
Starting Page 97
Ending Page 100
Page Count 4
File Format PDF
ISSN 09574522
Journal Journal of Materials Science: Materials in Electronics
Volume Number 10
Issue Number 2
e-ISSN 1573482X
Language English
Publisher Kluwer Academic Publishers
Publisher Date 1999-01-01
Publisher Place Boston
Access Restriction One Nation One Subscription (ONOS)
Subject Keyword Optical and Electronic Materials Characterization and Evaluation Materials
Content Type Text
Resource Type Article
Subject Atomic and Molecular Physics, and Optics Biomaterials Biophysics Condensed Matter Physics Electronic, Optical and Magnetic Materials Bioengineering Electrical and Electronic Engineering Biomedical Engineering
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