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| Content Provider | Springer Nature Link |
|---|---|
| Author | Bufler, F. M. Smith, L. |
| Copyright Year | 2013 |
| Abstract | The performance of FinFET and FDSOI devices is compared by 3D Monte Carlo simulation using an enhanced quantum correction scheme. This scheme has two new features: (i) the quantum correction is extracted from a 2D cross-section of the 3D device and (ii) in addition to using a modified oxide permittivity and a modified work function in subthreshold, the work function is ramped above threshold to a different value in the on-state. This approach improves the accuracy of the quantum-correction for multi-gate devices and is shown to accurately reproduce 3D density-gradient simulation also at short channel lengths. 15 nm FDSOI device performance with thin box and back-gate bias is found to be competitive: compared to a FinFET with (110)/〈110〉 sidewall/channel orientation, the on-current for N-type devices is 25 % higher and the off-current is only increased by a factor of 2.5. |
| Starting Page | 651 |
| Ending Page | 657 |
| Page Count | 7 |
| File Format | |
| ISSN | 15698025 |
| Journal | Journal of Computational Electronics |
| Volume Number | 12 |
| Issue Number | 4 |
| e-ISSN | 15728137 |
| Language | English |
| Publisher | Springer US |
| Publisher Date | 2013-11-07 |
| Publisher Place | Boston |
| Access Restriction | One Nation One Subscription (ONOS) |
| Subject Keyword | 3D Monte Carlo Quantum effects Fully-depleted SOI devices FinFET ApplicationMathematics/Computational Methods of Engineering Electrical Engineering Theoretical, Mathematical and Computational Physics Optical and Electronic Materials Mechanical Engineering |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering Modeling and Simulation |
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