NDLI: Oxidation and nitridation of niobium films by rapid thermal processing

Content Provider	Springer Nature Link
Author	Matylitskaya, Volha A. Bock, Wolfgang Thoma, Klaus Kolbesen, Bernd O.
Copyright Year	2006
Abstract	The oxidation and nitridation processes of niobium films in a rapid thermal processing (RTP) – system were investigated. 200 and 500 nm niobium films were deposited via sputtering on sapphire-(1-102)-substrate. At first niobium films were oxidized in molecular oxygen at temperatures ranging from 350 to 500 °C and for times of 1, 2 and 5 min and then nitridated in ammonia at 1000 °C for 1 min using an RTP system. For characterisation of the niobium films complementary analytical methods were used: X-ray diffraction (XRD) for phase analysis, secondary ion mass spectrometry (SIMS) for determining the elemental depth profiles of the films, scanning electron microscopy (SEM) and atomic force microscopy (AFM) for characterisation of the surface morphology of the films. The influence of the substrate, single crystalline sapphire, on the reactivity of the niobium films was studied in dependence of temperature, time of reaction and film thickness. The possibility of existence of niobium oxynitride phase was investigated. According to XRD and SIMS data, there is evidence that an oxynitride phase is formed after oxidation and subsequent nitridation in the bulk of some Nb films. In some of the experiments crack formation in the films or even delamination of the Nb films from the substrates was observed.
Starting Page	33
Ending Page	37
Page Count	5
File Format	PDF
ISSN	00263672
Journal	Microchimica Acta
Volume Number	156
Issue Number	1-2
e-ISSN	14365073
Language	English
Publisher	Springer-Verlag
Publisher Date	2006-07-17
Publisher Place	Vienna
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Analytical Chemistry Inorganic Chemistry Physical Chemistry Characterization and Evaluation Materials Monitoring/Environmental Analysis/Environmental Ecotoxicology
Content Type	Text
Resource Type	Article
Subject	Analytical Chemistry

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Nitridation of niobium films by rapid thermal processing: different behaviour of films on oxydized silicon and monocrystalline sapphire substrates

Production and characterization of nitrided CVD-SiC films

Electrocatalytic Oxidation of Nitric Oxide on an Electrode Modified with Fullerene Films

Properties of ITO films prepared by reactive magnetron sputtering

Rapid Fluorometric Screening of Antibiotics in Seafood

Quantitative analysis of silicon-oxynitride films by EPMA

Microanalysis of Glass Surfaces after Thermal Exposure

Disposable chemiluminometric sensor for rapid determination of EDTA

Rapid determination of hydroflumethiazide in dosage forms by time-resolved chemiluminescence

Oxidation and nitridation of niobium films by rapid thermal processing

Similar Documents

Nitridation of niobium films by rapid thermal processing: different behaviour of films on oxydized silicon and monocrystalline sapphire substrates

Production and characterization of nitrided CVD-SiC films

Electrocatalytic Oxidation of Nitric Oxide on an Electrode Modified with Fullerene Films

Properties of ITO films prepared by reactive magnetron sputtering

Rapid Fluorometric Screening of Antibiotics in Seafood

Quantitative analysis of silicon-oxynitride films by EPMA

Microanalysis of Glass Surfaces after Thermal Exposure

Disposable chemiluminometric sensor for rapid determination of EDTA

Rapid determination of hydroflumethiazide in dosage forms by time-resolved chemiluminescence

Oxidation and nitridation of niobium films by rapid thermal processing