NDLI: Nitridation of niobium films by rapid thermal processing: different behaviour of films on oxydized silicon and monocrystalline sapphire substrates

Content Provider	Springer Nature Link
Author	Brunkahl, Oliver Mertens, Regine Bock, Wolfgang Thoma, Klaus Kolbesen, Bernd Ottmar
Copyright Year	2006
Abstract	By electron beam evaporation and RF magnetron sputtering 500 nm thick niobium films were deposited on thermally oxidized Si-(100)-wafers and by RF magnetron sputtering on monocrystalline sapphire-(1-102)-wafers. Investigations by scanning electron microscopy (SEM) and atomic force microscopy (AFM) revealed differences of the film morphology depending on the substrate used: films deposited on SiO2 exhibited an even surface with small crystallites, films on sapphire showed parallel surface structures with relatively large and well-shaped crystallites pointing at regular crystal growth influenced by the substrate. These differences in film morphology were also reflected in different reflection intensities of the films in XRD patterns, indicating that the films deposited on sapphire were strongly textured. In a first set of experiments nitridation in molecular nitrogen and ammonia was investigated. In a second set of experiments, it was tried to form oxynitrides of niobium by annealing the nitrided films in molecular oxygen. Particularly by X-ray-diffraction the formation of different nitride and oxide phases in dependence of the reaction temperature was examined. Further, elemental depth profiles were recorded by secondary ion mass spectrometry (SIMS) to track the position of the phases formed in the film.The different substrates led to disparate film reactivities, resulting in different nitridation grades of the films at similar reaction temperatures. In general, larger crystallite sizes resulted in less chemical reactivity of the films: even after nitridation at 1000 °C metallic niobium was still present in films deposited on sapphire. However, no evidence was obtained for the formation of oxynitrides by the process sequence observed.
Starting Page	39
Ending Page	51
Page Count	13
File Format	PDF
ISSN	00263672
Journal	Microchimica Acta
Volume Number	156
Issue Number	1-2
e-ISSN	14365073
Language	English
Publisher	Springer-Verlag
Publisher Date	2006-06-06
Publisher Place	Vienna
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Analytical Chemistry Inorganic Chemistry Physical Chemistry Characterization and Evaluation Materials Monitoring/Environmental Analysis/Environmental Ecotoxicology
Content Type	Text
Resource Type	Article
Subject	Analytical Chemistry

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