Loading...
Please wait, while we are loading the content...
Similar Documents
Fabrication of Step and Flash imprint lithography templates using commercial mask processes
| Content Provider | Semantic Scholar |
|---|---|
| Author | Thompson, Ecron Rhyins, Peter D. Voisin, Ronald D. Sreenivasan, S. V. Martin, P. M. |
| Copyright Year | 2003 |
| Abstract | This article presents the results of a collaborative effort between Molecular Imprints, Inc. (MII) and Photronics, Inc. to develop a baseline process for fabricating Step and Flash Imprint Lithography (S-FIL) templates that are compatible with lithography tools being developed by MII. S-FIL is a replication technique with sub-50nm resolution capability that has the potential to lead to a low cost, high throughput process. Template fabrication results and S-FIL patterning results on 200mm wafers are presented. |
| File Format | PDF HTM / HTML |
| DOI | 10.1117/12.490141 |
| Volume Number | 5037 |
| Alternate Webpage(s) | http://cnt.canon.com/wp-content/uploads/2014/11/SPIE-2004-Commercial-Imprint-Masks.pdf |
| Alternate Webpage(s) | https://doi.org/10.1117/12.490141 |
| Journal | SPIE Advanced Lithography |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
