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Manufacturing Apparatus and Method of Manufacturing Semconductor Device
| Content Provider | Semantic Scholar |
|---|---|
| Author | Smith, Matthew |
| Copyright Year | 2017 |
| Abstract | A method of purging a Semiconductor manufacturing appa ratus comprises a step of etching a CVD-deposited film deposited in a chamber constituting a Semiconductor manu facturing apparatus which has performed a process of form ing a CVD film using a CVD process over a semiconductor wafer by using an etching gas containing at least a halogen gas, and a step of purging a cleaning gas remaining in the chamber by causing a gas containing hydrogen to flow into the chamber after the step of etching the CVD-deposited film by using the cleaning gas. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/bd/24/3d/39daad9a9113fc/US6903025.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
