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Cost of ownership analysis for patterning using step and flash imprint lithography
| Content Provider | Semantic Scholar |
|---|---|
| Author | Sreenivasan, S. V. Willson, C. Grant Schumaker, Norman Edwin Resnick, Douglas Jeffrey |
| Copyright Year | 2002 |
| Abstract | While the critical dimension in the microelectronics industry is continually going down due to developments in photolithography, it is coming at the expense of exponential increase in lithography tool costs and rising photomask costs. Step and Flash Imprint Lithography (S-FIL) is a nano-patterning technique that results in significantly lower cost of the lithography tool and process consumables. In this study, a comparison of S-FIL with Extreme Ultraviolet (EUV) photolithography technique is provided at the 50nm node. Advantages and disadvantages of S-FIL for various application sectors are provided. Finally, cost of ownership (CoO) computations of S-FIL versus EUV is provided. CoO computations indicate that S-FIL may be the cost-effective technology in the sub-100nm domain, particularly for emerging devices that are required in low volumes. |
| File Format | PDF HTM / HTML |
| DOI | 10.1117/12.472275 |
| Alternate Webpage(s) | http://willson.cm.utexas.edu/Research/Sub_Files/SFIL/Publications/2002/SPIE%202002%20COO%20for%20SFIL.pdf |
| Alternate Webpage(s) | https://doi.org/10.1117/12.472275 |
| Volume Number | 4688 |
| Journal | SPIE Advanced Lithography |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
