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Nanostructured p-type Cr/V2O5 thin films with boosted thermoelectric properties
| Content Provider | Semantic Scholar |
|---|---|
| Author | Loureiro, Joana Santos, João V. S. Nogueira, Adriana Wyczisk, Frédéric Divay, Laurent Reparaz, Sebastian Alzina, Francesc Torres, Clivia M. Sotomayor Cuffe, John Montemor, Fatima M. Martins, Rodrigo Ferreira, Isabel |
| Copyright Year | 2014 |
| Abstract | The urgent need for non-toxic and abundant thermoelectric materials has become a significant motivation to improve the figures of merit of metal oxides in order to remove the barrier towards their widespread use for thermoelectric applications. Here we show the influence of a Cr layer in boosting the thermoelectric properties of vanadium pentoxide (V2O5) thin films, deposited by thermal evaporation and annealed at 500 °C. The Cr to V2O5 thickness ratio controls the morphological and thermoelectric properties of the thin films produced. The optimized Seebeck coefficient and power factor values at room temperature are +50 μV K−1 and 7.9 × 10−4 W m−1 K−2, respectively. The nanograin structure of the films is responsible for an improvement in the electrical conductivity up to 3 × 105 (Ω m)−1 with a typical thermal conductivity of 1.5 W m−1 K−1. These results combine to yield promising p-type thermoeletric CrV2O5 thin films with a ZT of 0.16 at room temperature. |
| Starting Page | 6456 |
| Ending Page | 6462 |
| Page Count | 7 |
| File Format | PDF HTM / HTML |
| DOI | 10.1039/C3TA15168A |
| Volume Number | 2 |
| Alternate Webpage(s) | https://pubs.rsc.org/en/content/getauthorversionpdf/C3TA15168A |
| Alternate Webpage(s) | https://doi.org/10.1039/C3TA15168A |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
