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X‐ray photoelectron spectroscopy study of the stability of Fomblin Z25 on the native oxide of aluminum
| Content Provider | Semantic Scholar |
|---|---|
| Author | Herrera-Fierro, Pilar Pepper, Stephen V. Jones, William R. |
| Copyright Year | 1992 |
| Abstract | Thin films of Fomblin Z25, a perfluoropolyalkylether lubricant, were vapor deposited onto clean, oxidized aluminum, and sapphire surfaces, and their behavior at different temperatures was studied using x‐ray photoelectron spectroscopy and temperature desorption spectroscopy (TDS). It was found that the interfacial fluid molecules decompose on the native oxide at room temperature, and continue to decompose at elevated temperatures, as previous studies had shown to occur on the clean metal. TDS indicated that different degradation mechanisms were operative for clean and oxidized aluminum. On sapphire substrates, no reaction was observed at room temperature. Our conclusion is that the native oxide of aluminum is neither passive nor protective towards Fomblin Z25. At higher temperatures (150 °C) degradation of the polymer on sapphire produced a debris layer at the interface with a chemical composition similar to the one formed on aluminum oxide. Rubbing a Fomblin film on a single crystal sapphire also induced. |
| Starting Page | 2746 |
| Ending Page | 2751 |
| Page Count | 6 |
| File Format | PDF HTM / HTML |
| DOI | 10.1116/1.577904 |
| Volume Number | 10 |
| Alternate Webpage(s) | https://ntrs.nasa.gov/archive/nasa/casi.ntrs.nasa.gov/19920013942.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
