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MICROMACHINED ARRAYED DIP PEN NANOLITHOGRAPHY PROBES FOR SUB-100 nm DIRECT CHEMISTRY PATTERNING
| Content Provider | Semantic Scholar |
|---|---|
| Author | Bullen, David A. Wang, Xuefeng Zou, Jun Seunghun Chung, Sung-Wook Ryu, Kee Suk Fan, Zhifang Mirkin, Chad A. Liu, Chang |
| Copyright Year | 2002 |
| Abstract | We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://www-mtl.mit.edu/researchgroups/mems-salon/nori_Nano-dip-pen.pdf |
| Alternate Webpage(s) | http://medx.mech.northwestern.edu/publications/papers/89.pdf |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | Actuation Dosing Unit Chemical vapor deposition Dual in-line package Iodine 10 MG/ML Topical Solution Nanolithography Nicotinamide adenine dinucleotide (NAD) |
| Content Type | Text |
| Resource Type | Article |
