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Optical and Langmuir probe diagnostics of an Argon plasma in an RF reactive magnetron sputtering system
| Content Provider | Semantic Scholar |
|---|---|
| Author | 伸介, 森田 Mori, Shinsuke |
| Copyright Year | 2011 |
| Abstract | Plasma diagnostics of an argon RF magnetron reactive sputtering system, used for the deposition of titanium oxide or titanium oxide doped with nitrogen were performed using optical emission spectroscopy and Langmuir probe systems. In the optical method, we have used a modified corona model to estimate the electron temperature, which has been recently developed by Boffard et al. [1] The influence of electron energy distribution function (EEDF) on the estimation of electron temperature by the modified corona model is addressed. Electron temperature estimated by the optical method assuming MaxwellianEEDF is much lower than that measured by the Langmuir probe system in the experimental conditions tested. However, when non-Maxwellian EEDF calculated by Boltzmann solver including electron-electron collisions was applied to the modified corona model, the discrepancy between the optical method and the Langmuir probe system was improved and the estimated electron temperatures are almost identical with those of the Langmuir probe systems. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://www.ispc-conference.org/ispcproc/ispc20/244.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
