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Studies on plasma diagnostics and ITO film deposition using an RF-assisted closed-field dual magnetron sputtering system
| Content Provider | Semantic Scholar |
|---|---|
| Author | Ruzic, David N. Meng, L. Raju, Ramesh Flauta, R. Neumann, Martin John Shin, Hyung Joo Dockstader, Tod |
| Copyright Year | 2009 |
| Abstract | We present some results of the plasma diagnostics and ITO film deposition using an RF-assisted closed-field dual magnetron sputtering system. The RF plasma assistance enhanced the electron density to an order of magnitude higher and effectively enhanced the ionization fraction of the sputtered metal flux to about 90%. An increase of the deposition rate was also observed. Successful reactive deposition of ITO on large area PET substrates had also been demonstrated using a pair of industrial-scale 9 x 46 cm linear magnetron cathodes. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://www.ispc-conference.org/ispcproc/papers/607.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
