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Growth and properties of amorphous Ti–B–Si–N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targets
| Content Provider | Semantic Scholar |
|---|---|
| Author | Fager, Hanna Greczynski, Grzegorz Jensen, Jens Dahl Hultman, Lars |
| Copyright Year | 2014 |
| Abstract | Abstract Amorphous nitrides are explored for their homogeneous structure and potential use as wear-resistant coatings, beyond their much studied nano- and microcrystalline counterparts. (TiB 2 ) 1-x Si x N thin films were deposited on Si(001) substrates by a hybrid technique of high power impulse magnetron sputtering (HIPIMS) combined with dc magnetron sputtering (DCMS) using TiB 2 and Si targets in a N 2 /Ar atmosphere. By varying the sputtering dc power to the Si target from 200 to 2000 W while keeping the average power to the TiB 2 -target, operated in HIPIMS mode, constant at 4000 W, the Si content in the films increased gradually from x = 0.01 to x = 0.43. The influence of the Si content on the microstructure, phase constituents, and mechanical properties was systematically investigated. The results show that the microstructure of as-deposited (TiB 2 ) 1-x Si x N films changes from nanocrystalline with 2–4 nm TiN grains for x = 0.01 to fully electron diffraction amorphous for x = 0.22. With increasing Si content, the hardness of the films increases from 8.5 GPa with x = 0.01 to 17.2 GPa with x = 0.43. |
| Starting Page | 442 |
| Ending Page | 447 |
| Page Count | 6 |
| File Format | PDF HTM / HTML |
| DOI | 10.1016/j.surfcoat.2014.10.053 |
| Volume Number | 259 |
| Alternate Webpage(s) | http://liu.diva-portal.org/smash/get/diva2:716728/FULLTEXT01.pdf |
| Alternate Webpage(s) | https://doi.org/10.1016/j.surfcoat.2014.10.053 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
