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On a Photoresist Detector Background of the Invention
| Content Provider | Semantic Scholar |
|---|---|
| Copyright Year | 2017 |
| Abstract | 5 OTHER PUBLICATIONS Iwata et al., Applied Optics, Jun. 1974, vol. 13, No. 6, pp. 1327-1336. Bartolini, Applied Optics, vol. 13, No. 1, Jan. 1974, 129-139, Beesley et al., Applied Optics, vol. 9, No. 12, Dec. 1970, pp. 2720-2724. Bartolini et al., Applied Optics, vol. 9, No. 10, 1970, pp. 2283-2290. Bartolini et al., Journal of the Electrical Chemical Soci ety, vol. 120, No. 10, pp. 1408-1413, Oct. 1973. Primary Examiner-Jack P. Brammer Attorney, Agent, or Firm-Limbach, Limbach & Sutton 57 ABSTRACT A photoresist holographic technique in which the ob ject modified and reference beam are of substantially the same average intensity, the photoresist is exposed for a long period of time and subsequently developed for a very short period of time. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/fa/b4/04/1784bd560a7b23/US4343874.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Patent |
