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Transparent Conducting p-type NiO:Li thin films prepared by Spray Pyrolysis Technique
| Content Provider | Semantic Scholar |
|---|---|
| Author | Menaka, S. Mani Umadevi, Ganugula |
| Copyright Year | 2018 |
| Abstract | Pure nickel oxide (NiO) and lithium-doped nickel oxide (NiO:Li) thin films are deposited on glass substrates by the spray pyrolysis technique using nickel chloride hexahydrate and lithium chloride monohydrate as starting materials. The effects of lithium concentration (0-8%) on the XRD, SEM, FTIR, UV-Vis-NIR, and electrical analysis of the films are studied. XRD structural analysis showed that all the NiO and NiO:Li films exhibit polycrystalline cubic structure with (200) preferred orientation. XRD results showed that the crystallite sizes are around 17.86 nm to 21.43 nm. The optical band gap decreases from 3.94 eV to 3.69 eV. All the NiO and NiO:Li films are p-type. The carrier concentration of 3.98×10 cm, carrier mobility of 2.76 cm2 V s, and low resistivity of 0.56×10 Ω cm are reasonable values for p-type TCO thin films. IndexTerms Nickel oxide; Thin films; Spray pyrolysis; Grain size; Band gap; Resistivity |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://www.jetir.org/papers/JETIR1809847.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
