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Focus effects in submicron optical lithography, part 4: metrics for depth of focus
| Content Provider | Semantic Scholar |
|---|---|
| Author | Mack, Chris A. |
| Copyright Year | 1995 |
| Abstract | Common uses of the term 'depth of focus' (DOF) are explored as it relates to semiconductor lithography. A definition of DOF is given which is most appropriate to photolithography for IC manufacturing and this definition is compared to other DOF metrics. In particular, simple methods for determining DOF (either experimentally or through simulation) lead to DOF-like metrics. These metrics are compared to the definition of DOF and their accuracy are evaluated. Examples of the use of the definition for DOF for studying trends in lithography are given. |
| File Format | PDF HTM / HTML |
| DOI | 10.1117/12.209276 |
| Alternate Webpage(s) | http://www.lithoguru.com/scientist/litho_papers/1995_45_Focus%20Effects%20in%20Submicron%20Optical%20Lithography_Part%204.pdf |
| Alternate Webpage(s) | https://doi.org/10.1117/12.209276 |
| Volume Number | 2440 |
| Journal | Advanced Lithography |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
